| 摘要 |
PROBLEM TO BE SOLVED: To form a phase shift pattern as designed and to reduce a probability of generating defects due to pattern drop.SOLUTION: A light-shielding film (13) on a transparent substrate (11) is patterned to form a non-phase-shift light-transmitting part (15) and a light-shielding part (14), as well as to form, within a region of a phase-shift light-transmitting part (17), a temporary pattern (23a) having a light-shielding film (13) smaller than the above region. A second resist pattern (25) is formed on the transparent substrate (11), the second resist pattern having such a part (25a) in the region of the phase-shift light-transmitting part (17) that has a smaller resist height than a resist height on the light-shielding film (13) remaining in the region of the light-shielding part (14). The temporary pattern (23a) is removed by etching by using the second resist pattern (25) as a mask so as to partially expose the surface of the transparent substrate (11); and the exposed part of the substrate is subjected to wet etching to form the phase-shift light-transmitting part (17). |
