| 摘要 |
PROBLEM TO BE SOLVED: To provide an imprint device which is advantageous for balancing accurate pattern formation with throughput.SOLUTION: An imprint device 1 embosses an imprint material 12 on a substrate 10 with a mold 8 to form a pattern on the substrate 10. The imprint device 1 includes supply means 6 which supplies a permeable gas, which permeates at least one of the mold 8, the imprint material 12, and the substrate 10, and a condensible gas, which is liquefied by pressure increase caused by the mold 8. The imprint device 1 supplies the permeable gas and the condensible gas to a space between the imprint material 12 and the mold 8 to perform the embossment. |
