LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

摘要

The present invention provides a lithography apparatus including an optical system housing for an optical system which irradiates a substrate with a beam for forming a pattern, a reflecting member which is provided with the optical system housing and having a reflecting surface parallel to an optical axis of the optical system, and a measurement device configured to measure a rotation angle of the optical system housing by causing measurement light to be incident on each of at least three incident points which are not on the same straight line on the reflecting surface, wherein in the reflecting member a through-hole is formed in a region among the at least three incident points in a direction parallel to the optical axis, and is fixed to the optical system housing via a fixing member in the through-hole.

主权项

1. A lithography apparatus which forms a pattern on a substrate, the apparatus comprising:
an optical system housing for an optical system which irradiates the substrate with a beam for forming the pattern; a reflecting member which is provided with the optical system housing and having a reflecting surface parallel to an optical axis of the optical system; and a measurement device configured to measure a rotation angle of the optical system housing by causing measurement light to be incident on each of at least three incident points which are not on the same straight line on the reflecting surface, wherein in the reflecting member a through-hole is formed in a region among the at least three incident points in a direction parallel to the optical axis, and is fixed to the optical system housing via a fixing member in the through-hole.