COMPOSITION FOR REMOVING SUBSTANCES FROM SUBSTRATES

摘要

Stripping compositions are described that are useful for removing organic substances from substrates, for example, electronic device substrates such as microelectronic wafers or flat panel displays. The stripping compositions may be suitable for removing photoresists, including acrylic-based negative dry film photoresist, from electronic devices. In one embodiment, the stripping compositions can include a polar protic solvent, an amine or alkanoamine, and a quaternary ammonium hydroxide. In one embodiment the stripping compositions can include a polar protic solvent and at least two alkanoamines. The stripping compositions may be free of polar aprotic solvents.

主权项

1. A composition comprising:
from about 1 wt. % to about 90 wt. %. of a polar protic solvent; from about 1 wt. % to about 75 wt. % of an amine or alkanolamine; and from about 0.5 wt. % to about 10 wt. % of quaternary ammonium hydroxide.