发明名称 DEEP METAL DEPOSITION IN A POROUS MATRIX BY HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS), POROUS SUBSTRATES IMPREGNATED WITH METAL CATALYST AND USES THEREOF
摘要 The invention concerns porous substrates impregnated with metal catalyst, in particular intended for use as electrodes in a fuel cell such as a proton exchange membrane cell, and method for preparing same. In particular, the present invention concerns a method for impregnating a porous substrate with metal catalyst by high power impulse magnetron sputtering of one or more metal targets, the target(s) and the substrate being placed in an enclosure containing a gaseous plasma medium, the metal of the target(s) being chosen from the transition metals and the alloys of same, said method comprising the following steps: a) applying a pulsed voltage Ut to the target, b) polarising the porous substrate by applying a pulsed voltage Us with a delay Δt relative to the start of step (a).
申请公布号 WO2015114168(A1) 申请公布日期 2015.08.06
申请号 WO2015EP52207 申请日期 2015.02.03
申请人 CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS);COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIESALTERNATIVES;UNIVERSITE D'ORLEANS 发明人 CUYNET, STÉPHANE;CAILLARD, AMAËL;BRAULT, PASCAL;BIGARRE, JANICK;BUVAT, PIERRICK
分类号 H01M4/86;C23C14/16;C23C14/35;G01N27/16;G01N33/00;H01M4/88;H01M4/90;H01M8/10 主分类号 H01M4/86
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