发明名称 |
DEEP METAL DEPOSITION IN A POROUS MATRIX BY HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS), POROUS SUBSTRATES IMPREGNATED WITH METAL CATALYST AND USES THEREOF |
摘要 |
The invention concerns porous substrates impregnated with metal catalyst, in particular intended for use as electrodes in a fuel cell such as a proton exchange membrane cell, and method for preparing same. In particular, the present invention concerns a method for impregnating a porous substrate with metal catalyst by high power impulse magnetron sputtering of one or more metal targets, the target(s) and the substrate being placed in an enclosure containing a gaseous plasma medium, the metal of the target(s) being chosen from the transition metals and the alloys of same, said method comprising the following steps: a) applying a pulsed voltage Ut to the target, b) polarising the porous substrate by applying a pulsed voltage Us with a delay Δt relative to the start of step (a). |
申请公布号 |
WO2015114168(A1) |
申请公布日期 |
2015.08.06 |
申请号 |
WO2015EP52207 |
申请日期 |
2015.02.03 |
申请人 |
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS);COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIESALTERNATIVES;UNIVERSITE D'ORLEANS |
发明人 |
CUYNET, STÉPHANE;CAILLARD, AMAËL;BRAULT, PASCAL;BIGARRE, JANICK;BUVAT, PIERRICK |
分类号 |
H01M4/86;C23C14/16;C23C14/35;G01N27/16;G01N33/00;H01M4/88;H01M4/90;H01M8/10 |
主分类号 |
H01M4/86 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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