发明名称 |
GAS CONFINER ASSEMBLY FOR ELIMINATING SHADOW FRAME |
摘要 |
<p>The present disclosure relates to a gas confiner assembly designed to reduce the non-uniform deposition rates by confining the gas flow and changing the local gas flow distribution near the edge regions of the substrate. The material, size, shape and other features of the gas confiner assembly can be varied based on the processing requirements and associated deposition rates. In one embodiment, a gas confiner assembly for a processing chamber comprises a gas confiner configured to decrease gas flow and compensate for high deposition rates on edge regions of substrates. The gas confiner assembly also comprises a cover disposed below the gas confiner. The cover is configured to prevent a substrate support from being exposed to plasma.</p> |
申请公布号 |
WO2015116430(A1) |
申请公布日期 |
2015.08.06 |
申请号 |
WO2015US11974 |
申请日期 |
2015.01.20 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
ZHAO, LAI;WANG, QUNHUA;TINER, ROBIN L.;CHOI, SOO YOUNG;PARK, BEOM SOO |
分类号 |
C23C16/50;C23C16/455 |
主分类号 |
C23C16/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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