发明名称 METROLOGY METHOD AND APPARATUS, SUBSTRATE, LITHOGRAPHIC SYSTEM AND DEVICE MANUFACTURING METHOD.
摘要 In a dark-field metrology method using a small target, a characteristic of an image of the target, obtained using a single diffraction order, is determined by fitting a combination fit function to the measured image. The combination fit function includes terms selected to represent aspects of the physical sensor and the target. Some coefficients of the combination fit function are determined based on parameters of the measurement process and/or target. In an embodiment the combination fit function includes jinc functions representing the point spread function of a pupil stop in the imaging system.
申请公布号 NL2014071(A) 申请公布日期 2015.08.06
申请号 NL20142014071 申请日期 2014.12.30
申请人 ASML NETHERLANDS B.V. 发明人 SMILDE HENDRIK JAN HIDDE;AUER BASTIAAN ONNE FAGGINGER;HARUTYUNYAN DAVIT;WARNAAR PATRICK
分类号 G01B11/30;G03F7/20 主分类号 G01B11/30
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