METHOD FOR PASSIVATING SURFACES, FUNCTIONALIZING INERT SURFACES, LAYERS AND DEVICES INCLUDING SAME

摘要

The invention provides a method for passivation of various surfaces (metal, polymer, semiconductors) from external contaminants, and the functionalization of inert surfaces. The method of the invention can functionalize 2D semiconductor and other insert surfaces such as non-reactive metals, oxides, insulators, glasses, and polymers. The method includes formation of a monolayer, an ordered bilayer or an ordered multilayer of metal phthalocyanines (MPc). The invention also provides layer structure in a semiconductor device, the layer structure comprising one of an ordered monolayer, ordered bilayer or ordered multi-layer of metal phthalocyanine upon a surface, and one of an ALD deposited layer or 2D semiconductor on the one of a monolayer, ordered bilayer or ordered multi-layer of metal phthalocyanine.

主权项

1. A method for passivation of surface from external contaminants, and functionalization of inert surfaces, comprising:
depositing metal phthalocyanine (MPc) on a surface; and annealing the metal phthalocyanine at a temperature and duration selected to form one of a monolayer, ordered bilayer or ordered multi-layer.