发明名称 CARBON NANOTUBE TRANSISTOR HAVING EXTENDED CONTACTS
摘要 A semiconductor device includes a substrate that extends along a first direction to define a length and second direction perpendicular to the first direction to define a height. The substrate includes a dielectric layer and at least one gate stack formed on the dielectric layer. A source contact is formed adjacent to a first side of the gate stack and a drain contact formed adjacent to an opposing second side of the gate stack. A carbon nanotube is formed on the source contact and the drain contact. A first portion of the nanotube forms a source. A second portion forms a drain. A third portion is interposed between the source and drain to define a gate channel that extends along the first direction. The source and the drain extend along the second direction and have a greater length than the gate channel.
申请公布号 WO2015116310(A1) 申请公布日期 2015.08.06
申请号 WO2014US68526 申请日期 2014.12.04
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 HAN, SHU-JEN;HAENSCH, WILFRIED;HANNON, JAMES, B
分类号 H01L29/78;H01L21/336 主分类号 H01L29/78
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