发明名称 PERFORATING TWO-DIMENSIONAL MATERIALS USING BROAD ION FIELD
摘要 <p>Perforating graphene and other two-dimensional materials with holes inclusively having a desired size range, a narrow size distribution, and a high hole density can be difficult to achieve. A layer in continuous contact with graphene, graphene-based materials and other two-dimensional materials can help promote hole formation. Processes for perforating a two-dimensional material can include exposing to an ion source a two-dimensional material in continuous contact with at least one layer, and interacting a plurality of ions from the ion source with the two-dimensional material and with the at least one layer. The ion source may be a broad ion beam.</p>
申请公布号 WO2015116946(A1) 申请公布日期 2015.08.06
申请号 WO2015US13805 申请日期 2015.01.30
申请人 LOCKHEED MARTIN CORPORATION 发明人 BEDWORTH, PETER V.
分类号 H01J37/317;H01J37/08 主分类号 H01J37/317
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