LOW THERMAL EMISSIVITY FILM USING AMORPHOUS SI-IN-ZNO MULTILAYER STRUCTURE

摘要

Disclosed is a thermal radiation barrier wherein an underlayer, an insulative layer, and a protective layer make up a multi-layer structure applied to the top of a substrate. The thermal radiation barrier includes a first amorphous silicon indium zinc oxide layer as the underlayer on the substrate; a silver layer as the insulative layer on the first amorphous silicon indium zinc oxide layer; and a second amorphous silicon indium zinc oxide layer as the protective layer on the silver layer. The content of silicone included in each of the first and second amorphous silicon indium zinc oxide layers is in the range of 0.01 wt% and 30 wt%.