| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition capable of reducing generation of defects and excellent in storage stability, and to provide a method for forming a resist pattern.SOLUTION: The resist composition comprises: a base component (A) the solubility of which with a developing solution is changed by an action of an acid; an acid generator component (B) that generates an acid by exposure; and a compound component (F) having a fluorine-containing organic group, which has a fluorinated alkylester group at an end thereof, in a side chain. |
