发明名称 基板処理方法および基板処理装置
摘要 <p>PROBLEM TO BE SOLVED: To provide a substrate processing device capable of enhancing the throughput.SOLUTION: A substrate processing device 100 includes an indexer block 11, a first processing block 12, a second processing block 13 and an interface block 14. An exposure device 15 is disposed contiguously to the interface block 14. Between the second processing block 13 and the interface block 14, a mounting and buffering section P-BF1 and a mounting and buffering section P-BF2 are provided. The mounting and buffering sections P-BF1, P-BF2 are configured to house a plurality of substrates, respectively.</p>
申请公布号 JP5758509(B2) 申请公布日期 2015.08.05
申请号 JP20140007244 申请日期 2014.01.17
申请人 发明人
分类号 H01L21/027;H01L21/677 主分类号 H01L21/027
代理机构 代理人
主权项
地址