| 摘要 |
The present invention provides an exposure apparatus and an exposure method using the same, and the exposure apparatus comprises: a light-source which emits a beam; a modified mirror capable of reflecting the beam at a set angle and modifying a surface; an open plate which is disposed on between the light-source and the modified mirror and has an open unit formed within an inner side of the open plate, thus passing the beam which has a shape of the open unit; a driver stage which fixes a substrate exposed by the beam reflected by the modified mirror and is capable of moving in the direction intersecting a route of the beam reflected by the modified mirror; an imaging unit which disposes on a one side of the driver stage and shoots an image of the beam reflected by the modified mirror and incident to the driver stage direction; and a control unit including the amount of deformation of the modified mirror, the amount of movement of the driver stage and imaging control of the imaging unit, wherein the exposure apparatus and the exposure method has simply configuration and easily makes an error correction by erasing errors between designed exposure-pattern and exposure-pattern after actual exposure without consideration of other factors through adjusting an incidence angle. |
