Exposure apparatus, method of controlling the same and method of manufacturing device

摘要

An exposure apparatus exposes a resist on a substrate to light via an optical system. The exposure apparatus includes: a table configured to position the substrate at an exposure position upon holding the substrate; an obtaining unit configured to obtain a distance from an alignment mark formed on the substrate to a resist surface, and a tilt of the resist surface; and a control unit configured to calculate a correction value for correcting a shift in exposure position, that occurs upon tilt correction of the table, so as to reduce the tilt of the resist surface, using the distance and the tilt, and control a position of the table in accordance with the correction value.

主权项

1. An exposure apparatus which exposes a resist on a substrate to light via an optical system, the apparatus comprising:
a table configured to position the substrate at an exposure position upon holding the substrate; an obtaining unit configured to obtain a distance from an alignment mark formed on the substrate to a resist surface at a position of the alignment mark, and a tilt of the resist surface with respect to a predetermined surface; and a control unit configured to calculate a correction value for correcting a shift in exposure position, that occurs upon tilt driving of said table, using the distance and the tilt, and control a position of said table in accordance with the correction value.