发明名称 |
Soil additives for promoting seed germination, for prevention of evaporation and methods for use |
摘要 |
The present invention relates to methods of improving germination rates of plants or crops, and of preventing or arresting water evaporation loss from targeted soil areas by use of soil additives, which allow for improved water utilization by crops, plants, grasses, vegetation, etc. |
申请公布号 |
US9096793(B2) |
申请公布日期 |
2015.08.04 |
申请号 |
US201113817953 |
申请日期 |
2011.04.26 |
申请人 |
RHODIA (CHINA) CO. LTD. |
发明人 |
Cristobal Galder;Metivier Pascal;Castaing Jean-Christophe;Ji Pengfei;Chen Zhiyun |
分类号 |
C09K17/00;C09K17/14;C09K17/52;A01G1/00 |
主分类号 |
C09K17/00 |
代理机构 |
Eckert Seamans Cherin & Mellott, LLC |
代理人 |
Fein, Esq. Michael B.;Eckert Seamans Cherin & Mellott, LLC |
主权项 |
1. A method for improving the germination rate of a plant or crop comprising contacting a top layer of a target soil area with a surface additive, whereby the surface additive forms a layer on the target soil area wherein contacting a top layer of a target soil area with a surface additive occurs prior to or during water-stressed conditions, wherein water-stressed conditions means that the target soil area is watered with less than 8 mm of water over at least a 3 day period, over at least a 4 day period, over at least a 5 day period, over at least a 7 day period, or over at least a 10 day period. |
地址 |
Shanghai CN |