| 发明名称 | Donor substrate and method of forming transfer pattern using the same | ||
| 摘要 | A donor substrate includes a base substrate; a light reflection layer disposed on the base substrate and overlapped with a portion of the base substrate, a heat blocking pattern disposed on the light reflection layer, overlapped with the light reflection layer, and including a plurality of air holes; a light-to-heat conversion layer disposed on the base substrate; and a transfer layer disposed on the light-to-heat conversion layer. | ||
| 申请公布号 | US9099687(B2) | 申请公布日期 | 2015.08.04 |
| 申请号 | US201314098624 | 申请日期 | 2013.12.06 |
| 申请人 | SAMSUNG DISPLAY CO., LTD. | 发明人 | Lee Joon Gu;Choung Ji Young;Choi Jin Baek;Bang Hyunsung;Lee Yeon Hwa;Kim Won Jong;Song Young-Woo |
| 分类号 | H01L21/00;H01L51/56;B41M5/42;B41M5/382;H01L51/00 | 主分类号 | H01L21/00 |
| 代理机构 | Lee & Morse, P.C. | 代理人 | Lee & Morse, P.C. |
| 主权项 | 1. A donor substrate, comprising: a base substrate; a light reflection layer disposed on the base substrate and overlapped with a portion of the base substrate; a heat blocking pattern disposed on the light reflection layer, overlapped with the light reflection layer, and including a plurality of air holes; a light-to-heat conversion layer disposed on the base substrate; and a transfer layer disposed on the light-to-heat conversion layer. | ||
| 地址 | Yongin, Gyeonggi-Do KR | ||