Lithographic apparatus and device manufacturing method

摘要

A gas knife configured to dry a surface in an immersion lithographic apparatus is optimized to remove liquid by ensuring that a pressure gradient is built up in the liquid film on the surface being dried.

主权项

1. A lithographic projection apparatus, comprising:
a projection system arranged to project a pattern from a patterning device onto a substrate through a liquid; a gas knife configured to provide gas to a surface to be dried; and an extractor positioned adjacent the gas knife to remove gas, liquid, or both, wherein an outlet of the gas knife and an inlet of the extractor are formed in a substantially flat surface, the distance between the inlet of the extractor and the outlet being 0.5 to 0.8 times the distance the flat surface extends on the other side to the extractor of the gas knife to the nearer of another extractor or the end of the flat surface on the other side.