Schottky barrier diode and method of manufacturing the same

摘要

A schottky barrier diode may include a first n− type epitaxial layer disposed on a first surface of an n+ type silicon carbide substrate, a first p+ region disposed in the first n− type epitaxial layer, a second n type epitaxial layer disposed on the first n− type epitaxial layer and the first p+ region, a second p+ region disposed in the second n type epitaxial layer, a schottky electrode disposed on the second n type epitaxial layer and the second p+ region, and an ohmic electrode disposed on a second surface of the n+ type silicon carbide substrate, wherein the first p+ region and the second p+ region may be in contact with each other.

主权项

1. A schottky barrier diode comprising:
an n− type epitaxial layer disposed on a first surface of an n+ type silicon carbide substrate; a first p+ region disposed in the n− type epitaxial layer; an n type epitaxial layer disposed on the n− type epitaxial layer and the first p+ region; a second p+ region disposed in the n type epitaxial layer and formed in a quadrangle shape; a schottky electrode disposed on and contacting the n type epitaxial layer and the second p+ region; and an ohmic electrode disposed on a second surface of the n+ type silicon carbide substrate, wherein the first p+ region comprises a first portion formed in a quadrangle shape and a second portion disposed on the first portion and connected to the first portion, wherein the second p+ region is directly placed on the first portion of the first p+ region, such that the first portion of the first p+ region and the second p+ region are in contact with each other, wherein the second portion of the first p+ region is connected to the second p+ region through the first portion of the first p+ region, wherein the n type epitaxial layer comprises a middle portion and an outer edge portion surrounding the middle portion; and wherein the second p+ region is disposed on the outer edge portion of the n type epitaxial layer and is not disposed in the middle portion of the n type epitaxial layer.