System, method and computer program product for classification within inspection images

摘要

In accordance with an aspect of the presently disclosed subject matter, there is provided an analysis system for classifying possible defects identified within an inspection image of an inspected object, the system comprising a pattern matcher configured to determine an anchor location with respect to the inspection image, based on a matching of a template and a portion of the inspection image; wherein an accuracy of the determining of the anchor location exceeds a resolution of the inspection image; a distribution analysis module configured to determine, based on the anchor location and a mask which defines different segments within an area, a distribution of a potential defect with respect to one or more of the segments; and a classifier, configured to classify the potential defect based on the distribution.

主权项

1. An analysis system for classifying possible defects identified within an inspection image of an inspected object, the system comprising:
a storage device; and a processor, coupled to the storage device, to: match a template and a portion of the inspection image, thus giving rise to a matching portion of the inspection image, wherein the inspection image is captured by an inspection tool; determine, using a mask corresponding to the template and defining one or more segments within the matching portion of the inspection image, a location of a potential defect with respect to the one or more segments, thus giving rise to a matching segment of the inspection image, the matching segment corresponding to the location of the potential defect; and classify the potential defect based on the matching segment, thereby considering the location of the potential defect with regard to the respective segment defined within the inspection image, wherein the processor is further to define the mask based on a reference image of an inspected-object reference area, to downsample a part of the reference image, and to generate the template based on a result of the downsampling, the reference image and the mask are characterized by a resolution exceeding a resolution of the inspection image.