发明名称 Conductive film having oxide layer and method of manufacturing the same
摘要 Provided are a conductive film and a method of manufacturing the same. The conductive film includes a substrate, a first conductive layer formed on the substrate, and a patterned second conductive layer formed on the first conductive layer. Here, oxide layers are formed on top and side surfaces of the second conductive layer. The conductive film may prevent defects of the conductive layer caused by rapid oxidation or damage to the substrate, and increase emission uniformity.
申请公布号 US9101059(B2) 申请公布日期 2015.08.04
申请号 US201313894928 申请日期 2013.05.15
申请人 LG Chem, Ltd. 发明人 Kim Ji Hee;Kim Jung Bum;Lee Jung Hyoung;Park Min Choon
分类号 H05K1/02;H05K3/10;H01L31/0224;H01L31/0392;H01L31/18 主分类号 H05K1/02
代理机构 McKenna Long & Aldridge, LLP 代理人 McKenna Long & Aldridge, LLP
主权项 1. A conductive film, comprising: a substrate; a first conductive layer formed on the substrate; and a patterned second conductive layer (M1) formed on the first conductive layer, wherein oxide layers ((M2)xOy) are formed on top and side surfaces of the second conductive layer (M1), wherein M1 includes copper (Cu), aluminum (Al), molybdenum (Mb), chromium (Cr), magnesium (Mg), calcium (Ca), sodium (Na), potassium (K), titanium (Ti), indium (In), yttrium (Y), lithium (Li), gadolinium (Gd), silver (Ag), tin (Sn), lead (Pb) or an alloy containing two or more thereof, M1 and M2 are the same with each other, x is a number from 1 to 3, and y is a number from 1 to 4.
地址 Seoul KR