| 发明名称 | Donor substrate and method for forming transfer pattern using the same | ||
| 摘要 | A donor substrate includes a base layer, a light-to-heat conversion layer disposed on the base layer, a buffer layer disposed on the light-to-heat conversion layer and a transfer layer disposed on the buffer layer. The buffer layer includes a cross-linked polymer, a spacer polymer bonded to the cross-linked polymer, and a perfluoroalkyl alcohol group bonded to the spacer polymer. | ||
| 申请公布号 | US9099651(B2) | 申请公布日期 | 2015.08.04 |
| 申请号 | US201314036648 | 申请日期 | 2013.09.25 |
| 申请人 | SAMSUNG DISPLAY CO., LTD. | 发明人 | Kwon YoungGil |
| 分类号 | H01L21/00;H01L51/00;H01L51/56 | 主分类号 | H01L21/00 |
| 代理机构 | F. Chau & Associates, LLC | 代理人 | F. Chau & Associates, LLC |
| 主权项 | 1. A donor substrate comprising: a base layer; a light-to-heat conversion layer disposed on the base layer; a buffer layer disposed on the light-to-heat conversion layer, the buffer layer including a cross-linked polymer, a spacer polymer bonded to the cross-linked polymer, and a perfluoroalkyl alcohol group bonded to the spacer polymer; and a transfer layer disposed on the buffer layer, wherein the transfer layer is attached to the buffer layer through a bonding force therebetween. | ||
| 地址 | Yongin, Gyeonggi-Do KR | ||