发明名称 Bipolar junction transistor with spacer layer
摘要 New designs for silicon carbide (SiC) bipolar junction transistors (BJTs) and new methods of manufacturing such SiC BJTs are described. The SiC BJT comprises a collector region, a base region and an emitter region disposed as a stack, the emitter region and part of the base region forming a mesa. The intrinsic part of the base region includes a first portion having a first doping concentration and a second portion having a second doping concentration lower than the first doping concentration. Further, the second portion is vertically disposed between the first portion and the emitter region in the stack.
申请公布号 US9099517(B2) 申请公布日期 2015.08.04
申请号 US201314048940 申请日期 2013.10.08
申请人 Fairchild Semiconductor Corporation 发明人 Konstantinov Andrei
分类号 H01L29/73;H01L29/66;H01L29/732;H01L29/10;H01L29/16;H01L29/04;H01L29/06;H01L29/08 主分类号 H01L29/73
代理机构 Brake Hughes Bellermann LLP 代理人 Brake Hughes Bellermann LLP
主权项 1. A silicon carbide (SiC) bipolar junction transistor (BJT), comprising: a collector region of n-type conductivity; a base region of p-type conductivity; and an emitter region of n-type conductivity; the collector region, the base region and the emitter region being disposed as a stack, the emitter region and a part of the base region forming a mesa, the part of the base region being capped by the emitter region and including a first portion having a first doping concentration and a second portion having a second doping concentration lower than the first doping concentration, the second portion being vertically stacked between the first portion and the emitter region.
地址 San Jose CA US