发明名称 |
Bipolar junction transistor with spacer layer |
摘要 |
New designs for silicon carbide (SiC) bipolar junction transistors (BJTs) and new methods of manufacturing such SiC BJTs are described. The SiC BJT comprises a collector region, a base region and an emitter region disposed as a stack, the emitter region and part of the base region forming a mesa. The intrinsic part of the base region includes a first portion having a first doping concentration and a second portion having a second doping concentration lower than the first doping concentration. Further, the second portion is vertically disposed between the first portion and the emitter region in the stack. |
申请公布号 |
US9099517(B2) |
申请公布日期 |
2015.08.04 |
申请号 |
US201314048940 |
申请日期 |
2013.10.08 |
申请人 |
Fairchild Semiconductor Corporation |
发明人 |
Konstantinov Andrei |
分类号 |
H01L29/73;H01L29/66;H01L29/732;H01L29/10;H01L29/16;H01L29/04;H01L29/06;H01L29/08 |
主分类号 |
H01L29/73 |
代理机构 |
Brake Hughes Bellermann LLP |
代理人 |
Brake Hughes Bellermann LLP |
主权项 |
1. A silicon carbide (SiC) bipolar junction transistor (BJT), comprising:
a collector region of n-type conductivity; a base region of p-type conductivity; and an emitter region of n-type conductivity; the collector region, the base region and the emitter region being disposed as a stack, the emitter region and a part of the base region forming a mesa, the part of the base region being capped by the emitter region and including a first portion having a first doping concentration and a second portion having a second doping concentration lower than the first doping concentration, the second portion being vertically stacked between the first portion and the emitter region. |
地址 |
San Jose CA US |