| 主权项 |
1. A method for improving film uniformity on a substrate comprising:
placing a first substantially flat surface opposite a nozzle and in a void region between elements of a transport mechanism; placing a second substantially flat surface in a second void region between elements of a transport mechanism and adjacent to the first substantially flat surface,
wherein the first and second substantially flat surfaces are supported by a bar located below the first and second substantially flat surfaces and are connected to the bar with respective adjustable connectors; placing an exhaust basket substantially directly beneath the first substantially flat surface; connecting the exhaust basket to a source of reduced pressure, the exhaust basket having an intake, the intake positioned beneath the nozzle and the first and second substantially flat surfaces; and introducing a vapor through the nozzle toward the first and second substantially flat surfaces; wherein the exhaust basket is configured to receive a portion of the vapor from the nozzle. |
