发明名称 |
Transistor having an active region with wing structure |
摘要 |
A semiconductor device includes an active region having a channel region and at least a wing region adjoining the channel region under the gate dielectric layer. The at least one wing region may be two symmetrical wing regions across the channel region. |
申请公布号 |
US9099556(B2) |
申请公布日期 |
2015.08.04 |
申请号 |
US201113213409 |
申请日期 |
2011.08.19 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
Chu Chen-Liang;Chen Fei-Yuh;Chen Yi-Sheng;Hsiao Shih-Kuang;Tsai Chun Lin;Thei Kong-Beng |
分类号 |
H01L29/76;H01L29/78;H01L29/10;H01L29/06 |
主分类号 |
H01L29/76 |
代理机构 |
Lowe Hauptman & Ham, LLP |
代理人 |
Lowe Hauptman & Ham, LLP |
主权项 |
1. An integrated circuit structure having formed therein a transistor comprising:
a semiconductor substrate having an active region defined by an isolation region; a gate dielectric layer over a portion of the active region of the semiconductor substrate; and a gate electrode over the gate dielectric layer, wherein the portion of the active region under the gate dielectric layer includes a channel region between a drain region and a source region and at least one wing region adjoining the channel region, wherein the wing region is trapezoidal having a base edge adjoining the channel region, triangular with a base edge adjoining the channel region, saw-tooth with a base edge adjoining the channel region or semi-circular with a base edge adjoining the channel region. |
地址 |
TW |