发明名称 Transistor having an active region with wing structure
摘要 A semiconductor device includes an active region having a channel region and at least a wing region adjoining the channel region under the gate dielectric layer. The at least one wing region may be two symmetrical wing regions across the channel region.
申请公布号 US9099556(B2) 申请公布日期 2015.08.04
申请号 US201113213409 申请日期 2011.08.19
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 Chu Chen-Liang;Chen Fei-Yuh;Chen Yi-Sheng;Hsiao Shih-Kuang;Tsai Chun Lin;Thei Kong-Beng
分类号 H01L29/76;H01L29/78;H01L29/10;H01L29/06 主分类号 H01L29/76
代理机构 Lowe Hauptman & Ham, LLP 代理人 Lowe Hauptman & Ham, LLP
主权项 1. An integrated circuit structure having formed therein a transistor comprising: a semiconductor substrate having an active region defined by an isolation region; a gate dielectric layer over a portion of the active region of the semiconductor substrate; and a gate electrode over the gate dielectric layer, wherein the portion of the active region under the gate dielectric layer includes a channel region between a drain region and a source region and at least one wing region adjoining the channel region, wherein the wing region is trapezoidal having a base edge adjoining the channel region, triangular with a base edge adjoining the channel region, saw-tooth with a base edge adjoining the channel region or semi-circular with a base edge adjoining the channel region.
地址 TW