| 摘要 |
PROBLEM TO BE SOLVED: To accurately determine a pattern formation position/exposure position in a maskless exposure device.SOLUTION: An exposure device including a DMD has a light-shielding part 40 having slits ST1 to ST2 formed at an equal distance and installed above a single photosensor PD, and projects a position detection pattern string PT comprising a plurality of bar-like patterns PL1 to PL4 parallel to a sub scanning direction Y while an exposure area makes relative displacement through the light-shielding part 40. The exposure device detects a half value of a light quantity signal output from a photosensor PD, calculates an exposure position from an intermediate position of the output of a trigger signal, and corrects the exposure position. |
