APPARATUS FOR SETTING MEASURING CONDITION OF PATTERN MEASURING DEVICE, AND PATTERN EVALUATION APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide an apparatus for setting a measuring condition of a pattern measuring device capable of setting the measuring condition for quickly and highly accurately evaluating a pattern formed by a DSA or a pattern subjected to DSA-based patterning.SOLUTION: The present invention proposes an apparatus for setting a condition of a pattern measuring device comprising an arithmetic unit for setting an operating condition of a charged particle radiation device on the basis of information obtained by an optical inspection apparatus, the arithmetic unit determining a frequency in response to the luminance of scattered light on the basis of scattered light information obtained by the optical inspection apparatus, and setting the field of view of the charged particle radiation device in an area on a sample in which a condition for the frequency satisfies a predetermined condition.