| 摘要 |
<p>The present invention relates to an HMDSO layer and an AF layer coating method on an aluminum metal layer. The HMDSO and AF layer on the aluminum metal layer are sequentially formed by a CVD method in a vacuum chamber. The present invention can even have a faster working time, and increases an adhesion of the AF layer coated on the aluminum metal layer of a smartphone; thereby having excellent durability of abrasion, brine resistance, and has a remarkable effect where defects do not occur.</p> |
