FREE ABRASIVE GRAIN, ABRASIVE MATERIAL FOR POLISHING FREE ABRASIVE GRAIN AND MANUFACTURING METHOD THEREFOR

摘要

PROBLEM TO BE SOLVED: To provide inexpensive free abrasive grain having high polishing speed to glass, stable polishing speed, hardly generating scratches by polishing and excellent in surface roughness. ! SOLUTION: There is provided a polishing agent for polishing free abrasive grain containing Mn2O3 and CeO2 and having a polycrystalline material consisting of Mn2O3 and CeO2 and the Ce content in the polishing agent of 10 to 40 atom% where the total atom numbers of Mn and Ce is 100 atom%. ! COPYRIGHT: (C)2015,JPO&INPIT