发明名称 VAPOR DEPOSITION APPARATUS, VAPOR DEPOSITION METHOD AND METHOD FOR MANUFACTURING ORGANIC ELECTROLUMINESCENCE ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus that is excellent in control accuracy of vapor deposition rate on a substrate in the whole vapor deposition region, and to provide a vapor deposition method and a method for manufacturing an organic electroluminescence element.SOLUTION: The vapor deposition apparatus for depositing a film on a substrate includes: a first film thickness monitor; and a vapor deposition unit including a vapor deposition source. The vapor deposition apparatus performs vapor deposition while controlling a distance between a part where an evaporated material is discharged from the vapor deposition source and a surface of the substrate to be evaporated on the basis of the measurement result of the first film thickness monitor.
申请公布号 JP2015140458(A) 申请公布日期 2015.08.03
申请号 JP20140014278 申请日期 2014.01.29
申请人 SHARP CORP;CANON TOKKI CORP 发明人 OCHI TAKASHI;INOUE SATOSHI;KOBAYASHI ISATAKE;MATSUNAGA KAZUKI;KAWATO SHINICHI;KIKUCHI KATSUHIRO;ICHIHARA MASAHIRO;MATSUMOTO EIICHI
分类号 C23C14/24;H01L51/50;H05B33/10 主分类号 C23C14/24
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