THINNER COMPOSITION FOR IMPROVING COATING AND REMOVING PERFORMANCE OF RESIST

摘要

The present invention relates to a thinner composition which improves removing efficiency of the unnecessary photoresist after application of the photoresist. The thinner comprises: at least one compound between propylene glycol alkyl (having 1 to 10 carbon atoms) ether acetate and alkyl (having 1 to 10 carbon atoms) alkoxy (having 1 to 10 carbon atoms) propionate; and ketone having 1 to 10 carbon atoms for the photoresist to be evenly coated on the front surface of a substrate even using a small amount of photoresist or SOH, thereby reducing the use amount of a photoresist to reduce process costs and improve productivity.