| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus in which plasma can be generated with good stability and reproducibility. ! SOLUTION: A substrate processing apparatus has a processing container, substrate holding means which is inserted into the processing container and removed therefrom while holding a plurality of substrates, gas supply means for supplying gas into the processing container, a plasma formation unit having a pair of side walls projecting to the outer peripheral side of the processing container, and a space formed by the side walls communicates with the processing container, a pair of electrodes provided on the outside each of the pair of side walls, an insulating protection cover provided so as to arrange the electrode in a space between itself and the side wall, and a high frequency power supply connected with the pair of electrodes. At least one of the pair of electrodes has a shape projecting to the side wall side. ! COPYRIGHT: (C)2015,JPO&INPIT |
