PLASMA PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To appropriately perform plasma processing using a microwave transmitted from a coaxial waveguide to a slow-wave plate by radiating the microwave uniformly in a circumferential direction in the slow-wave plate.SOLUTION: A plasma processing apparatus includes: a processing container for accommodating a workpiece; a coaxial waveguide 50 for transmitting a microwave generated in a microwave generator; and a slow-wave plate 43 for adjusting a wavelength of the microwave transmitted from the coaxial waveguide 50 and introducing the microwave to the processing container. A lower end portion 51a of an inner conductor 51 of the coaxial waveguide 50 has a tapered shape part of which a diameter is enlarged downwards. The slow-wave plate 43 has an annular shape in a planar view. An inner side face 43a of the slow-wave plate 43 surrounds the lower end portion 51a of the inner conductor 51 and is positioned radially outside of an inner side face 52a of an outer conductor 52 of the coaxial waveguide 50.