发明名称 INSPECTION APPARATUS AND INSPECTION METHOD
摘要 PROBLEM TO BE SOLVED: To provide an inspection apparatus and an inspection method capable of inspecting for TSV defects on a semiconductor chip.SOLUTION: The inspection apparatus for inspecting semiconductor chips having via holes penetrating a silicon substrate includes: a first probe (7-1) capable of emitting an electron beam; a sensing part (4) for detecting a result ("L"or"H") whether the via establishes the continuity; and a control section (5) that holds a piece of position information (dot circle information) of the via, controls the first probe (7-1) to move to a predetermined position based on the position information (dot circle information) and to emit electron beam to the via (TSV), and associates the result ("L"or"H") with the position information (dot circle information).
申请公布号 JP2015141985(A) 申请公布日期 2015.08.03
申请号 JP20140013521 申请日期 2014.01.28
申请人 TOSHIBA CORP 发明人 SETO MOTOJI
分类号 H01L21/66;G01R31/302 主分类号 H01L21/66
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