| 摘要 |
PROBLEM TO BE SOLVED: To provide an inspection device which can correct positional deviation due to deflection of a mask in a case of performing positional deviation measurement by an inspection device.SOLUTION: An inspection device comprises: an optical image acquisition part 150 which acquires an optical image of a photomask in which plural graphic patterns are formed; a positional deviation calculation circuit 146 which measures a first positional deviation amount in a horizontal direction of each position on the photomask due to deflection of the photomask surface caused by supporting the photomask by a supporting method in the case of acquiring the optical image; a positioning part which measures a second positional deviation amount of the plural graphic patterns by using the optical image; and a difference Pos map creation circuit 144 which creates a difference map in which the difference value obtained by subtracting the first positional deviation amount from the second positional deviation amount is made as a map value, about the area of the photomask surface. |
