处理液供给装置及处理液供给方法;PROCESSING LIQUID SUPPLYING APPARATUS AND PROCESSING LIQUID SUPPLYING METHOD

摘要

本发明旨在提供一种处理液供给装置及处理液供给方法。其中，依本发明之处理液供给装置，包含：处理液供给源，供给用来处理被处理体之处理液；喷吐部，经由供给通道连接该处理液供给源，对被处理体喷吐该处理液；过滤装置，设于该供给通道，以去除处理液中之异物；供给泵及喷吐泵，分别设于该供给通道中过滤装置之一次侧及二次侧；及控制部，输出控制信号，俾使用该供给泵及喷吐泵中至少一方，使由该处理液供给源供给之处理液减压而除气，接着使用该供给泵及喷吐泵，使经除气之处理液自该过滤装置之一次侧经由该过滤装置朝二次侧通过。; an ejection unit configured to eject the processing liquid to the substrate to be processed; a filter device configured to remove foreign matters in the processing liquid; a supply pump and an ejection pump which are provided in the supply path at a primary side and a secondary side of the filter device, respectively; and a control unit configured to output a control signal to decompress and degas the processing liquid supplied from the processing liquid supply source by using one of the supply pump and the ejection pump, and subsequently, pass the degassed processing liquid through the filer device beginning from the primary side to the secondary side of the filter device by using the supply pump and the ejection pump.