正型光阻组成物、使用它之光阻膜及图案形成方法、及其过滤方法,申请号TW102141650-传众专利搜索

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发明名称	正型光阻组成物、使用它之光阻膜及图案形成方法、及其过滤方法
摘要
申请公布号	TWI494698	申请公布日期	2015.08.01
申请号	TW102141650	申请日期	2006.07.24
申请人	富士软片股份有限公司	发明人	神田博美;汉那慎一;稻部阳树
分类号	G03F7/039;H01L21/027	主分类号	G03F7/039
代理机构		代理人	何金涂台北市大安区敦化南路2段77号8楼
主权项	一种正型光阻组成物，其包括：(A)因酸之作用而增强在硷显影溶液中溶解度的树脂；(B)在以光化射线或放射线照射时产生酸之化合物；(C)含至少一种选自(x)至(z)之基的含氟化合物：(x)硷溶性基；(y)因硷显影溶液之作用分解而增强在硷显影溶液中溶解度之基；及(z)因酸之作用而分解之基；及(F)溶剂；其中树脂(A)含具有内酯环之基；含氟化合物(C)为树脂；且含氟化合物(C)加入正型光阻组成物之量按光阻组成物之所有固体成分计为0.1至10质量%。
地址	日本

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