发明名称 |
METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE, METHOD OF FORMING PATTERN AND METHOD OF FORMING FINE PATTERN |
摘要 |
A method for manufacturing a structure including a phase-separated structure includes the steps of: forming a layer which includes an Si containing block copolymer combining the plural kinds of blocks between guide patterns on a supporter; forming a top coat film by spraying a top coat material on the layer and the guide pattern; and separating the phase of the layer which includes the Si containing block copolymer on which the top coat film is formed by thermal annealing. The solvent of the top coat material does not include a basic material. |
申请公布号 |
KR20150088203(A) |
申请公布日期 |
2015.07.31 |
申请号 |
KR20150010713 |
申请日期 |
2015.01.22 |
申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
SESHIMO TAKEHIRO;MAEHASHI TAKAYA;DAZAI TAKAHIRO;UTSUMI YOSHIYUKI;MATSUMIYA TASUKU;MIYAGI KEN;SHIONO DAIJU;KUROSAWA TSUYOSHI |
分类号 |
H01L21/027;G03F7/32 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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