| 摘要 |
<p>Disclosed is a susceptor for a substrate processing apparatus, comprising: a process chamber forming a sealed processing space; and the susceptor installed in the process chamber, wherein a substrate is mounted. The susceptor comprises: a substrate support surface corresponding to the plane size of the substrate and supporting the substrate; and an outside protruding unit formed along edges of the substrate supported on the substrate support surface, and protruding upwards with an interval from the edges of the substrate supported on the substrate support surface.</p> |
