| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for cleaning or inspection of a vapor-phase growth apparatus by which heavy metal contamination caused by the maintenance of a vapor-phase growth apparatus can be reduced.SOLUTION: A method for cleaning or inspection of a vapor-phase growth apparatus 1 comprises the step of reducing an oxygen density in a reaction chamber 3 to under an oxygen density in atmospheric air in cleaning or inspection which involves the opening of the reaction chamber 3 of the vapor-phase growth apparatus 1 put in an airtight condition, whereby the increase in heavy metal contamination caused by the maintenance of the vapor-phase growth apparatus 1 can be suppressed. Especially, the oxygen density in the reaction chamber 3 is made 100 ppm or below, whereby the heavy metal contamination can be prevented more effectively. |
