| 摘要 |
PROBLEM TO BE SOLVED: To provide a distribution feedback type semiconductor laser element capable of shortening the time required for electron beam lithography, and to provide a manufacturing method of the distribution feedback type semiconductor laser element.SOLUTION: A distribution feedback type semiconductor laser element includes: a substrate 12; an active layer 16 formed above the substrate 12; and a diffraction grating 20 having a first pattern 20a and a second pattern 20b which is shorter than the first pattern 20a and faces a center part of the first pattern 20a, the diffraction grating 20 diffracting light generated in the active layer 16. |
