| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a batch processing type large-area atomic layer deposition apparatus that can carry out an atomic layer vapor deposition process for many large-area glass substrates.SOLUTION: A large-area atomic layer deposition apparatus includes: a vacuum chamber 100 in which a vacuum can be produced; a partition valve formed on right and left side faces of the vacuum chamber; a process gas supply part 110 which is arranged upstream from the vacuum chamber, and jets a process gas as a laminar flow from above to below; a gas suction/discharge part 120 which is arranged below the vacuum chamber, and sucks a gas in the vacuum chamber and discharges it; a cassette 130 in which many substrates are vertically loaded and which is arranged between the process gas supply part and gas suction/discharge part so as to form an internal chamber for atomic layer vapor deposition process. Further, the large-area atomic layer deposition apparatus includes a cassette contact part 140 which is arranged above the gas suction/discharge part in the vacuum chamber, and elevates a cassette entering the vacuum chamber to bring the cassette into contact with the process gas supply part.</p> |
