| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an apparatus which corrects the positional deviation of an irradiation position caused by a charge amount in multi-beam drawing.SOLUTION: A drawing apparatus 100 includes: a charge amount distribution calculation unit 122 for calculating a charge amount distribution charged by the vertical incidence of a representative beam of a multi-beam to a specimen drawing area; a position correction unit 183 for calculating the correction position of each beam irradiation position which includes a positional deviation corrected including the positional deviation of the beam irradiation position, caused by the charge amount, using the charge amount distribution, dependent on the irradiation position of each beam of the multi-beam; and a drawing unit 150 for drawing a pattern on a specimen by controlling the radiation of each beam in such a manner that the irradiation pattern formation position of each beam of the multi-beam becomes each corresponding correction position.</p> |
