| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a film deposition device capable of forming a uniform coat on a surface of an object without causing increase in size.SOLUTION: A film deposition device (10) includes: a plasma processing mechanism (80) having a plurality of electrodes (81); an electrostatic atomization type spraying mechanism (30) having a plurality of spraying pipes (51); and a belt conveyor (15) for conveying an object (20) from the plasma processing mechanism (80) to the spraying mechanism (30) in this order. The spraying mechanism (30) is arranged in a position in which, in a conveyance direction of the belt conveyor (15), distance between the closest spraying pipe (51) and the electrode (81) becomes longer than the length of the object (20) in the conveyance direction. A voltage application part (45) of the spraying mechanism (30) is provided on the further plasma processing mechanism (80) side than the plurality of spraying pipes (51) in the conveyance direction.</p> |
