| 发明名称 |
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS |
| 摘要 |
A positive resist composition is provided comprising a polymer comprising recurring units having a carboxyl or phenolic hydroxyl group substituted with an acid labile group and recurring units of furaneol ester, and having a Mw of 1,000-500,000. The resist composition has a satisfactory effect of suppressing acid diffusion and a high resolution, and forms a pattern of good profile and minimal edge roughness after exposure. |
| 申请公布号 |
US2015212415(A1) |
申请公布日期 |
2015.07.30 |
| 申请号 |
US201514596566 |
申请日期 |
2015.01.14 |
| 申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
Hatakeyama Jun;Hasegawa Koji |
| 分类号 |
G03F7/039;C08F28/04;C08F24/00;C08F28/02;G03F7/20;G03F7/30 |
主分类号 |
G03F7/039 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A positive resist composition comprising a polymer comprising recurring units having a carboxyl and/or phenolic hydroxyl group substituted with an acid labile group and recurring units (a) having a furaneol ester, represented by the general formula (1), and having a weight average molecular weight of 1,000 to 500,000 as a base resin, wherein R1 is hydrogen or methyl, R2 is methyl or ethyl, and X is a single bond, a C1-C12 linking group having an ester radical, ether radical or lactone ring, phenylene group or naphthylene group. |
| 地址 |
Tokyo JP |
