发明名称 SUBSTRATE HEATING APPARATUS
摘要 A substrate heating apparatus includes: a heating chamber, as well as a heating unit and a suspension holding unit which are provided in the heating chamber. The heating unit is provided at the bottom of the heating chamber, and the suspension holding unit holds the substrate in suspension above the heating unit. The apparatus avoids collision and friction on the substrate, and ensures uniform heating of the substrate.
申请公布号 US2015211792(A1) 申请公布日期 2015.07.30
申请号 US201314366573 申请日期 2013.06.26
申请人 BOE TECHNOLOGY GROUP CO., LTD. ;BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD. 发明人 Jiao Yu;Wang Yanming;Yao Qingyang;Liu Jie
分类号 F26B21/02;F26B25/06;F26B21/14;F26B23/04;F26B21/12 主分类号 F26B21/02
代理机构 代理人
主权项 1. A substrate heating apparatus, comprising: a heating unit, and a suspension holding unit located on the heating unit and hold the substrate above the heating unit in suspension.
地址 Beijing CN