| 摘要 |
<p>PROBLEM TO BE SOLVED: To peel off a pellicle frame from a photomask with pellicle, by reducing residue of an adhesive remaining on a photomask surface.SOLUTION: A pellicle frame is peeled off through: a step of adding a load for peeling off from a photomask with pellicle by gradually increasing and adding a downward load to the pellicle frame of the photomask with pellicle by load increasing means, while grasping and holding the photomask with pellicle, directing a surface of a pellicle side downward by a substrate holding mechanism; and a step of observing a peeled state of the pellicle frame and determining the completion of peeling.</p> |
