PLASMA PROCESSING APPARATUS

摘要

In a plasma processing apparatus, an additional viewing window is disposed between an infrared temperature sensor and a view window, and the additional viewing window is cooled to be retained at room temperature (20° C. to 25° C.), to reduce and to stabilize electromagnetic waves emitted from the viewing window. By correcting the value of the electromagnetic waves, the measurement precision of the temperature monitor is increased and it is possible to measure and to control the dielectric window temperature in a stable state.

主权项

1. A plasma processing apparatus, comprising:
a processing chamber disposed in a vacuum container; gas supply means for supplying gas to the processing chamber; a sample stage which is disposed in the processing chamber and on which a sample to be processed is mounted; a planar member comprising a dielectric material which is disposed above the processing chamber to cover the processing chamber and through which an electric field supplied to form plasma in the processing chamber passes; an electric field supply path disposed outside the processing chamber for supplying the electric field to the planar member; an infrared sensor disposed on the outside the planar member apart therefrom for receiving an infrared ray emitted from the planar member and for thereby detecting temperature of the planar member; a first window member disposed between the planar member and the infrared sensor; and a second window member disposed between the planar member and the infrared sensor to be apart from the first window member, the first and second window members comprising one and the same material, wherein:
temperature of the second window member is in a predetermined range; andat reception of the infrared ray having passed through the first and second window members, the infrared sensor detects the temperature of the planar member.