发明名称 Systems and Methods for Generating Backside Substrate Texture Maps for Determining Adjustments for Front Side Patterning
摘要 Techniques disclosed herein a method and system for generating texture maps for the backside of a substrate. The texture maps may be used to determine process adjustments (e.g., depth of focus) for subsequent processing of the front side of the substrate.
申请公布号 US2015211836(A1) 申请公布日期 2015.07.30
申请号 US201514604393 申请日期 2015.01.23
申请人 Tokyo Electron Limited 发明人 deVilliers Anton J.;Mathews Todd A.;Robison Rodney Lee
分类号 G01B5/28;H01L21/66;H01L21/68;H01L21/67;H01L21/683 主分类号 G01B5/28
代理机构 代理人
主权项 1. A texture mapping system, comprising: a substrate chuck that can rotate a substrate around an axis, the substrate comprising a patterned front side surface that is opposite a backside surface; a profile sensor that can move across the backside surface of the substrate and generate a profile signal based, at least in part, on surface roughness on the backside surface of the substrate; a location controller that can generate a location signal based, at least in part, on locations of the profile sensor relative to the substrate; and a texture map component that can generate a texture map of the backside of the substrate based, at least in part, on the profile signal and the location signal, the texture map comprising an indication of surface roughness at locations on the backside of the substrate.
地址 Tokyo JP