| 发明名称 |
IMAGE PROCESSING DEVICE, DITHER MASK GENERATION METHOD, AND PROGRAM |
| 摘要 |
An image processing device includes a storing section configured to store a predetermined dither mask, a defective nozzle detecting section configured to detect a defective nozzle, and an interpolation processing section configured to specify a mask position corresponding to a position of the detected defective nozzle among mask positions included in the dither mask, and alter a threshold of a predetermined mask position so that a dot of the predetermined mask position included in the dither mask becomes ON when a dot of the specified mask position is ON. |
| 申请公布号 |
US2015210100(A1) |
申请公布日期 |
2015.07.30 |
| 申请号 |
US201514606124 |
申请日期 |
2015.01.27 |
| 申请人 |
SEIKO EPSON CORPORATION |
发明人 |
HAYASHI Takuma |
| 分类号 |
B41J29/393 |
主分类号 |
B41J29/393 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An image processing device comprising:
a storing section configured to store a predetermined dither mask; a defective nozzle detecting section configured to detect a defective nozzle; and an interpolation processing section configured to specify a mask position corresponding to a position of the detected defective nozzle among mask positions included in the dither mask, and alter a threshold of a predetermined mask position so that a dot of the predetermined mask position included in the dither mask becomes ON when a dot of the specified mask position is ON. |
| 地址 |
Tokyo JP |
